Product details
Product number
911-S7-09-00001
Type of source
CF40
Flange
CF40
Ion current
< 1 nA
Final energy
< 10 keV × q
Energy feed
Electron gun
The D.I.S EBIS-C1 is an electron beam ion source featuring an ultra-compact design while still being capable of producing beam currents of several hundred picoamperes (pA) of multi-charged ions of all gaseous elements and compounds. Themodular and operator-friendly D.I.SEBIS-C1 is suitable for use in a wide variety of applications for basic research in various scientific disciplines, for teaching and training, and for technological applications.
Special features
Documents
- Ultra-compact, modularized electron beam ion source (EBIS) mounted on a DN40CF flange for easy integration into customized facilities
- Beam currents of several hundred picoamperes (pA) of multi-charged ions from all gaseous elements and compounds
- Ion generation for ion extraction and X-ray/UV/EUV spectroscopy
- Two cathode options with different diameters available depending on the field of application
- Wien filter module for ion charge state and mass selection
- Easily combinable with other charged particle beam-related devices
- Simple, cost-effective, and user-friendly access to the world of highly charged ions