The compact D.I.S Germany Ion Irradiation and Implantation Facilities Type-M are based on a versatile Electron Cyclotron Resonance Ion Source (ECRIS), which is equipped with a Wien filter that separates the extracted ion beam by charge and mass. This product is intended for users in research and development as well as for industrial applications. It provides the irradiation and implantation of ions in samples up to 25 mm in size, with larger sizes available upon request.

  • ECRIS with a compact Wien filter for low to intermediate ion beam currents of several hundreds of microamps
  • Facility is offered with horizontal ion beam orientation
  • Vertical ion beam configurations are possible on demand